The semiconductor industry is entering a new era with High-NA EUV lithography, capable of printing features as small as 8 nm. Developed by ASML and adopted by Intel and SK hynix, it pushes Moore’s Law forward with 3× transistor density, higher yields, and lower complexity. From powering AI supercomputers to enabling next-gen memory and autonomous driving, the potential is enormous. While challenges like high costs and power demands remain, High-NA EUV is set to become the most transformative chipmaking technology of the decade.
